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Trapping of Micro Particles in Nanoplasmonic Optical Lattice
Published on: September 5, 2017
Nanopin plasmonic resonator array and its optical properties
Sheng Wang1, David F P Pile, Cheng Sun
1National Science Foundation Nanoscale Science and Engineering Center (NSEC), 5130 Etcheverry Hall, University of California, Berkeley, California 94720-1740, USA.
Nano Letters
|March 9, 2007
Summary
A novel electron-beam lithography technique fabricates high-aspect ratio nanopin arrays. These arrays exhibit tunable optical properties and electromagnetic interplay, enabling ultrasensitive chemical sensing applications.
Area of Science:
- Nanofabrication
- Plasmonics
- Metamaterials
Background:
- Fabrication of nanostructures with controlled optical properties is crucial for advanced sensing.
- Understanding electromagnetic interplay in complex metallic nanostructures is key to enhancing device performance.
Purpose of the Study:
- To present a one-step electron-beam lithography process for fabricating high-aspect ratio nanopin arrays.
- To investigate the tunable optical properties and electromagnetic coupling within these arrays.
- To explore the potential of these structures for ultrasensitive chemical sensing.
Main Methods:
- One-step electron-beam lithography for nanopin array fabrication.
- Experimental characterization of optical properties.
- Electromagnetic simulations to study component interplay.
Main Results:
- Successful fabrication of metal-capped dielectric nanopillars on metallic discs.
- Demonstration of highly tunable optical properties.
- Analysis of asymmetrical electromagnetic coupling due to size disparity between metallic components.
Conclusions:
- The developed lithography process enables efficient fabrication of complex nanopin arrays.
- The unique structure exhibits tunable plasmonic properties and significant electromagnetic interplay.
- These nanopin arrays show promise for developing ultrasensitive surface-enhanced Raman scattering (SERS) chemical sensor arrays.

