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Sectioning of multilayers to make a multilayer Laue lens
Hyon Chol Kang1, G Brian Stephenson, Chian Liu
1Center for Nanoscale Materials and Materials Science Division, Argonne National Laboratory, Argonne, IL 60439, USA. kanghc@gist.ac.kr
We developed a new method to create multilayer Laue lenses (MLLs) for efficient nanofocusing of hard X-rays. These MLLs achieve diffraction-limited performance, surpassing traditional fabrication limits.
Area of Science:
- Optics and X-ray Science
- Materials Science and Nanotechnology
Background:
- Photolithography limits the zone depth-to-width ratio in multilayer optics.
- Efficient nanofocusing of hard X-rays requires advanced optical elements.
Purpose of the Study:
- To report a novel fabrication process for multilayer Laue lenses (MLLs).
- To enable efficient nanofocusing of hard X-rays with improved optical element design.
Main Methods:
- Fabrication of MLLs via sectioning and thinning of multilayer films.
- Achieving a high zone depth-to-width ratio (>1000).
Main Results:
- Demonstrated a fabrication process yielding MLLs with unprecedented zone aspect ratios.
- Tested MLL structures at 19.5 keV X-ray energy.
- Observed diffraction-limited performance in fabricated MLLs.
Conclusions:
- The reported fabrication technique is effective for producing high-performance MLLs.
- This method overcomes limitations of photolithography for X-ray optics.
- The developed MLLs are suitable for efficient hard X-ray nanofocusing applications.
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