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Published on: April 12, 2019
RF sputter deposited nanocrystalline (110) magnetite thin film from alpha-Fe2O3 target
Murtaza Bohra1, N Venkataramani, Shiva Prasad
1Department of Physics, Indian Institute of Technology Bombay, Mumbai 400076, India.
Abstract:
Nanocrystalline magnetite thin film was prepared on to fused quartz substrate by sputtering at an rf power of 50 W. X-ray diffraction study showed that the sputtered film was (110) oriented. The stoichiometry in the thin film has been confirmed through a variety of characterization techniques. The room temperature spontaneous magnetization value (4piMs) of the film was 5100 G. This is about 85% of the bulk value. The resistivity of the film showed a sharp change around 120 K, indicative of the Verwey transition.
