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Updated: Jul 13, 2026

Graphene-Assisted Quasi-van der Waals Epitaxy of AlN Film on Nano-Patterned Sapphire Substrate for Ultraviolet Light Emitting Diodes
Published on: June 25, 2020
Deep ultraviolet light-emitting hexagonal boron nitride synthesized at atmospheric pressure
Yoichi Kubota1, Kenji Watanabe, Osamu Tsuda
1National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan. kubota.yoichi@nims.go.jp
Abstract:
Materials emitting light in the deep ultraviolet region around 200 nanometers are essential in a wide-range of applications, such as information storage technology, environmental protection, and medical treatment. Hexagonal boron nitride (hBN), which was recently found to be a promising deep ultraviolet light emitter, has traditionally been synthesized under high pressure and at high temperature. We successfully synthesized high-purity hBN crystals at atmospheric pressure by using a nickel-molybdenum solvent. The obtained hBN crystals emitted intense 215-nanometer luminescence at room temperature. This study demonstrates an easier way to grow high-quality hBN crystals, through their liquid-phase deposition on a substrate at atmospheric pressure.

