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Updated: Jul 10, 2026
08:53
Angle-resolved Photoemission Spectroscopy At Ultra-low Temperatures
Published on: October 9, 2012
Polarization-dependent vacuum-ultraviolet reflectometry using elliptically polarized synchrotron radiation.
Alexander Gottwald1, Françoise Bridou, Mireille Cuniot-Ponsard
1Physikalisch-Technische Bundesanstalt (PTB), Abbestrasse 2-12, 10587 Berlin, Germany. alexander.gottwald@ptb.de
Applied Optics
|November 13, 2007
Summary
Researchers developed a new method to measure vacuum-ultraviolet reflection polarization dependence. This technique enhances the characterization of polarizing mirrors, crucial for optical applications.
Area of Science:
- Optics and Photonics
- Synchrotron Radiation Applications
- Materials Science
Background:
- Characterizing polarization dependence is crucial for optical components.
- Synchrotron radiation offers unique properties for VUV spectroscopy.
- Existing methods for polarization analysis can be complex.
Purpose of the Study:
- To develop a novel procedure for investigating vacuum-ultraviolet (VUV) reflection polarization dependence.
- To accurately characterize elliptically polarized synchrotron radiation.
- To enable precise measurements of polarization effects on reflective samples.
Main Methods:
- Utilized polarization-sensitive photodetectors at PTB's normal-incidence monochromator beamline.
- Determined detector responsivity polarization dependency within the storage ring's orbital plane.
- Employed synchrotron radiation from the BESSY II electron-storage ring.
Main Results:
- Achieved relative standard uncertainties for polarization dependence measurements between 2.4% and 11%.
- Covered the spectral range from 60 to 160 nm.
- Successfully applied the method to optimize polarizing mirrors at the Lyman-alpha wavelength (121.6 nm).
Conclusions:
- The developed procedure provides a reliable method for VUV reflection polarization analysis.
- This technique enhances the optimization of optical components like polarizing mirrors.
- The findings contribute to advancements in VUV optics and metrology.
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