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Published on: August 10, 2019
Sample preparation of GaN-based materials on a sapphire substrate for STEM analysis
Hanako Okuno1, Masaki Takeguchi, Kazutaka Mitsuishi
1National Institute for Materials Science, 3-13 Sakura, Tsukuba 305-0003, Japan.
Journal of Electron Microscopy
|December 18, 2007
Summary
This study presents a wedge polishing technique for preparing gallium nitride (GaN)-based materials for transmission electron microscopy (TEM). The method yields atomically flat surfaces, enabling accurate composition analysis of Al(x)Ga(1-x)N.
Area of Science:
- Materials Science
- Solid State Physics
- Nanotechnology
Background:
- Gallium nitride (GaN)-based materials are crucial for advanced electronic and optoelectronic devices.
- High-resolution characterization techniques like transmission electron microscopy (TEM) require precisely prepared samples.
- Surface damage and amorphous layer formation during sample preparation can impede accurate analysis.
Purpose of the Study:
- To develop and detail a reliable sample preparation method for GaN-based materials using wedge polishing.
- To achieve atomically flat surfaces on TEM samples without introducing artifacts.
- To validate the prepared samples for advanced characterization, specifically for composition estimation.
Main Methods:
- A detailed recipe for wedge polishing of GaN-based materials for TEM is described.
- The prepared samples were analyzed using Z-contrast scanning transmission electron microscopy (STEM).
- Surface quality was assessed for flatness and absence of amorphous layers.
Main Results:
- The wedge polishing technique successfully produced GaN-based TEM samples with atomically flat surfaces.
- No significant surface damage or amorphous layer formation was observed.
- Composition estimation of aluminum gallium nitride (Al(x)Ga(1-x)N) using Z-contrast STEM on these samples showed good agreement with nominal values.
Conclusions:
- The presented wedge polishing technique is effective for preparing high-quality TEM samples of GaN-based materials.
- The method ensures surface integrity, crucial for accurate nanoscale compositional analysis.
- This technique facilitates reliable characterization of Al(x)Ga(1-x)N and similar semiconductor alloys.

