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Updated: Jul 8, 2026

Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh
Published on: May 3, 2019
Design and operating characteristics of new type cold cathode ion source
A Hassan1, N Bassal, S G Zakhary
1Accelerators and Ion Sources Department, NRC, AEA, AbuZaabal, Cairo 13759, Egypt.
This study introduces a novel saddle-field ion source, detailing its design and performance. The optimized source efficiently produces argon ion beams for various applications.
Area of Science:
- Plasma Physics
- Ion Source Technology
- Vacuum Engineering
Background:
- Traditional ion sources face limitations in beam quality and stability.
- Developing advanced ion sources is crucial for applications in materials science, accelerators, and space propulsion.
Purpose of the Study:
- To design and characterize a new type of saddle-field ion source.
- To investigate the influence of key operating parameters on ion source performance.
- To evaluate the potential of this source for generating ion beams.
Main Methods:
- An arc discharge is generated within a saddle electric field created by an annular anode and cathode flanges.
- An axial magnetic field is applied using a solenoid coil.
- Performance metrics including ion current, electron current, and energy spread are measured under varying conditions (arc power, pressure, voltages, magnetic field).
Main Results:
- The ion source successfully generates an argon ion current of approximately 0.6 mA and an electron current of approximately 4 mA.
- Optimal performance is achieved at specific operating conditions: 7 kV extraction voltage, 5.5x10(-4) Torr pressure, 400 V arc voltage, 1 A arc current, and 200 G magnetic field.
- An energy spread of 20 eV is observed at a discharge voltage of 400 V and 3 kV extraction voltage.
Conclusions:
- The novel saddle-field ion source demonstrates promising performance for generating ion beams.
- The design allows for control over ion beam properties through adjustment of operating parameters.
- This source represents a viable option for applications requiring stable and controllable ion beams.
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