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Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle

Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
The ions and electrons produced interact with the fluctuating magnetic field created by a water-cooled...
Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview01:19

Inductively Coupled Plasma–Mass Spectrometry (ICP–MS): Overview

In inductively coupled plasma–mass spectrometry (ICP–MS), an inductively coupled plasma (ICP) torch is used as an atomizer and ionizer. Solid samples are dissolved and volatilized before being introduced into the high-temperature argon plasma, while solution samples are nebulized and passed through the high-temperature argon plasma. Plasma dissociates the analytes and ionizes their component atoms to form a mixture of positive ions and molecular species. The positive ions are then passed on to...
Electrospray Ionization (ESI) Mass Spectrometry01:12

Electrospray Ionization (ESI) Mass Spectrometry

Higher molecular weight biomolecules are nonvolatile compounds that may decompose before ionizing or vaporizing during mass analysis with conventional electron impact ionization methods. Accordingly, electrospray ionization (ESI) is the favored method for vaporizing and ionizing biomolecules as it circumvents rapid fragmentation and enables the recording of mass signals for the entire biomolecule.
ESI utilizes electrical energy to transfer ions from the liquid phase of the sample into the...
Chemical Ionization (CI) Mass Spectrometry01:21

Chemical Ionization (CI) Mass Spectrometry

The molecular ion peak of a molecule in the mass spectrum provides vital information for molecular identification. However, conventional electron impact ionization can lead to the rapid dissociation of some molecular ions before they reach the detector. A milder ionization method is required to increase the lifetime of such ionized analyte molecules. Chemical ionization (CI) is a gas-phase protonation reaction useful for mass-analyzing analyte molecules that are easily protonated to yield the...
Atomic Emission Spectroscopy: Overview01:20

Atomic Emission Spectroscopy: Overview

Atomic emission spectroscopy (AES) is an analytical technique used to determine the elemental composition of a sample by analyzing the light emitted from excited atoms. In AES, atoms in a sample are excited to higher energy levels by thermal energy from high-temperature sources, such as plasma, arcs, or sparks. When these excited atoms return to lower energy states, they emit light at specific wavelengths characteristic of each element. The resulting atomic emission spectrum, which consists of...
Atomic Emission Spectroscopy: Instrumentation01:22

Atomic Emission Spectroscopy: Instrumentation

The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.

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Related Experiment Video

Updated: Jul 7, 2026

Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh
10:42

Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh

Published on: May 3, 2019

Inverted end-Hall-type low-energy high-current gaseous ion source.

E M Oks1, A V Vizir, M V Shandrikov

  • 1High Current Electronics Institute, Russian Academy of Sciences, Tomsk, Russia.

The Review of Scientific Instruments
|March 5, 2008
PubMed
Summary
This summary is machine-generated.

A new gaseous ion source generates low-energy, high-current ion beams using an inverted anode-cathode design and electron injection. This reliable, low-maintenance device offers efficient ion generation for various applications.

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Related Experiment Videos

Last Updated: Jul 7, 2026

Preparing an Isotopically Pure 229Th Ion Beam for Studies of 229mTh
10:42

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Published on: May 3, 2019

Electron Channeling Contrast Imaging for Rapid III-V Heteroepitaxial Characterization
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Published on: July 17, 2015

Photoelectron Imaging of Anions Illustrated by 310 Nm Detachment of F−
06:53

Photoelectron Imaging of Anions Illustrated by 310 Nm Detachment of F−

Published on: July 27, 2018

Area of Science:

  • Plasma Physics
  • Ion Beam Technology
  • Materials Science

Background:

  • Conventional ion sources face limitations in energy efficiency and plasma contamination.
  • Existing technologies often struggle with high-current, low-energy ion beam generation.
  • The need for advanced ion sources in sputtering, etching, and other ion technologies is growing.

Purpose of the Study:

  • To explore a novel approach for generating low-energy, high-current gaseous ion beams.
  • To develop and characterize a new ion source based on this technique.
  • To assess the performance and applicability of the developed ion source.

Main Methods:

  • Development of a DC high-current gaseous discharge ion source with electron injection.
  • Inversion of anode and cathode placement compared to conventional end-Hall sources.
  • Utilization of a cold hollow cathode for electron generation and injection.
  • Operation in a diverging axial magnetic field with low discharge voltage.

Main Results:

  • The developed ion source produces a DC ion flow with energy < 20 eV and current up to 2.5 A.
  • Low plasma contamination (<0.1% metallic ions) and narrow ion energy spread (2-3 eV rms) were achieved.
  • The source demonstrated high reliability, low maintenance, and long operational lifetime.
  • Specific electric energy consumption was measured at 400 eV per ion.

Conclusions:

  • The novel ion source design offers an effective method for low-energy, high-current ion beam generation.
  • The source's characteristics make it suitable for plasma sputtering, etching, and other ion-based technologies.
  • The device presents a reliable and efficient alternative to existing ion source technologies.