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Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
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Non-equilibrium Microwave Plasma for Efficient High Temperature Chemistry
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Inductive coupled radio frequency plasma bridge neutralizer.

F Scholze1, M Tartz, H Neumann

  • 1Leibniz Institute of Surface Modification, Permoserstr 15, Leipzig, Germany. frank.scholze@iom-leipzig.de

The Review of Scientific Instruments
|March 5, 2008
PubMed
Summary
This summary is machine-generated.

A novel radio frequency plasma bridge neutralizer (rf-PBN) offers long lifetime for ion thruster and material processing applications. This device inductively couples energy, allowing wide electron current control up to 1.6 A.

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Area of Science:

  • Plasma physics
  • Materials science
  • Space propulsion

Background:

  • Ion beam technologies require efficient neutralizers for stable operation.
  • Processing insulating materials with ion beams presents challenges due to charge accumulation.

Purpose of the Study:

  • To present a new radio frequency plasma bridge neutralizer (rf-PBN) design.
  • To evaluate its suitability for ion thruster and ion beam surface processing applications.

Main Methods:

  • Inductive coupling of energy into the plasma chamber.
  • Utilizing a compact tuning system to match input power to plasma impedance.
  • Controlling electron current via radio frequency input power.

Main Results:

  • The rf-PBN demonstrated a design with no internal components, suggesting a long operational lifetime.
  • Electron current was controllable over a wide range.
  • An extracted electron current of up to 1.6 A was achieved.

Conclusions:

  • The developed rf-PBN is a promising technology for ion thruster neutralization.
  • The device is suitable for ion beam surface processing of insulating materials.
  • The design offers enhanced longevity and control for plasma-based applications.