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Optical design of hybrid-type attenuated phase-shift masks for extreme-ultraviolet lithography by use of a
Hee Young Kang1, Chang Kwon Hwangbo
1Department of Physics, Inha University, Incheon 402-751, South Korea.
Abstract:
We have designed what we believe to be new hybrid-type attenuated phase-shift masks for extreme-ultraviolet optical lithography by use of a Fabry-Perot interference filter. The designs for the attenuated phase-shift masks show a smaller step height for less geometric shadow effects than additive- and subtractive-type attenuated phase-shift masks, a contrast higher than 94% for both deep-ultraviolet and extreme-ultraviolet wavelength regimes, and a 180 degrees phase-shift in the extreme-ultraviolet wavelength regime.
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