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Related Experiment Videos

Interferometric ellipsometer.

Lionel R Watkins1

  • 1Department of Physics, University of Auckland, Auckland, New Zealand. l.watkins@auckland.ac.nz

Applied Optics
|June 3, 2008
PubMed
Summary
This summary is machine-generated.

This study introduces a novel interferometric ellipsometer for direct measurement of tan(psi) and Delta. This advanced optical instrument achieves high precision, even for low-reflectivity samples.

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Area of Science:

  • Optical Physics
  • Materials Science
  • Metrology

Background:

  • Ellipsometry is a powerful technique for characterizing thin films and surfaces.
  • Traditional ellipsometers often require complex optical setups and multiple reflections.
  • Accurate measurement of polarization states is crucial for material analysis.

Purpose of the Study:

  • To develop a simplified interferometric ellipsometer design.
  • To enable direct measurement of ellipsometric parameters (tan(psi) and Delta).
  • To assess the performance with various sample types, including low-reflectivity surfaces.

Main Methods:

  • Utilized a modified Mach-Zehnder interferometer.
  • Incorporated a reference beam with stable polarization characteristics.

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  • Employed mechanical scanning for temporal fringe generation.
  • Spatially separated polarization components for detection.

    • Main Results:

    • Successfully measured tan(psi) and Delta directly from a single sample reflection.
    • Achieved excellent agreement with calibration data for a SiO(2) film.
    • Demonstrated capability for precise measurements on low-reflectivity glass surfaces.
    • Estimated noise performance indicates a precision of approximately 41 pm.

    Conclusions:

    • The novel interferometric ellipsometer offers a simplified and direct measurement approach.
    • The instrument exhibits high accuracy and precision for diverse sample types.
    • This design advances the field of ellipsometry for optical characterization.