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The Generation of Higher-order Laguerre-Gauss Optical Beams for High-precision Interferometry
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Published on: August 12, 2013

Automatic null ellipsometry with an interferometer.

Lionel R Watkins1

  • 1Department of Physics, University of Auckland, P.B. 92019, Auckland, New Zealand. l.watkins@auckland.ac.nz

Applied Optics
|November 12, 2009
PubMed
Summary
This summary is machine-generated.

This study introduces a novel automatic null ellipsometry technique, replacing traditional analyzers with a heterodyne interferometer for faster, iterative measurements. The new method accurately determines thin film properties, matching conventional ellipsometry results.

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Area of Science:

  • Optics and Photonics
  • Materials Science
  • Surface Science

Background:

  • Traditional null ellipsometry (polarizer compensator sample analyzer - PCSA) relies on iterative measurements.
  • Accurate characterization of thin films is crucial for semiconductor and optical industries.
  • Existing methods can be time-consuming and complex.

Purpose of the Study:

  • To develop a new, non-iterative automatic null ellipsometry approach.
  • To enhance the speed and simplicity of ellipsometric measurements.
  • To validate the accuracy of the novel technique against established methods.

Main Methods:

  • Replaced the analyzer in a PCSA ellipsometer with a heterodyne Michelson interferometer.
  • Modified one interferometer arm to produce a stable, linearly polarized reference beam.
  • Interferometrically recombined beams and spatially separated polarizations to analyze fringe phase and amplitude.

Main Results:

  • The relative phase of temporal fringes directly correlated with the polarizer angle, enabling non-iterative nulling.
  • The reflected light's azimuthal angle was easily determined from fringe amplitude at null.
  • Measurements on silicon native oxide films showed excellent agreement with traditional PCSA ellipsometry.

Conclusions:

  • The heterodyne interferometer-based approach offers a faster, iterative-free method for automatic null ellipsometry.
  • This technique provides accurate thin film characterization comparable to conventional ellipsometers.
  • The new method simplifies the process of determining optical properties of materials.