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Updated: Jun 27, 2026

Building Langmuir Probes and Emissive Probes for Plasma Potential Measurements in Low Pressure, Low Temperature Plasmas
Published on: May 25, 2021
A capacitive probe with shaped probe bias for ion flux measurements in depositing plasmas
M C Petcu1, A C Bronneberg, A Sarkar
1Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Netherlands. m.c.petcu@tue.nl
Abstract:
The application of a pulse shaped biasing method implemented to a capacitive probe is described. This approach delivers an accurate and simple way to determine ion fluxes in diverse plasma mixtures. To prove the reliability of the method, the ion probe was used in a different configuration, namely, a planar Langmuir probe. In this configuration, the ion current was directly determined from the I-V characteristic and compared with the ion current measured with the pulse shaped ion probe. The results from both measurements are in excellent agreement. It is demonstrated that the capacitive probe is able to perform spatially resolved ion flux measurements under high deposition rate conditions (2-20 nm/s) in a remote expanding thermal plasma in Ar/NH(3)/SiH(4) mixture.
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