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Thickness microscopy based on photothermal radiometry for the measurement of thin films
Liping Wang1, Helmut Prekel, Hengbiao Liu
1College of Chemistry and Molecular Science, Wuhan University, Wuhan, Hubei Province 430072, People's Republic of China. liping_wang-2002@yahoo.com
Abstract:
The photothermal detection technique is an innovative and non-contact method to investigate the properties of films on workpieces. This paper describes a novel experimental set-up for thickness microscopy based on photothermal radiometry. The correlation between the thermal wave signal and the film thickness is deduced and evaluated to determine the film thickness with a lateral resolution of less than 1mm. Results indicate that the thickness microscopy is a useful method to characterize thin films and has the potential to be applied in-process.
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