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Published on: September 28, 2019
Preparation, microstructure and optical absorption behaviour of NiO thin films
Amit Kumar Srivastava1, Subhash Thota, Jitendra Kumar
1Materials Science Programme, Indian Institute of Technology Kanpur, Kanpur 208016, India.
Journal of Nanoscience and Nanotechnology
|December 4, 2008
Summary
Nickel oxide (NiO) thin films were fabricated and characterized. Annealing temperature and solution molarity influenced the NiO films
Area of Science:
- Materials Science
- Solid State Physics
- Nanotechnology
Background:
- Nickel oxide (NiO) is a p-type semiconductor with diverse applications.
- Thin film deposition techniques are crucial for tailoring material properties.
Purpose of the Study:
- To investigate the effect of annealing temperature and solution molarity on the structural, microstructural, and optical properties of NiO thin films.
- To explore the potential of NiO thin films for optical and electronic applications.
Main Methods:
- Spin coating deposition of NiO thin films using nickel acetate tetrahydrate solution.
- Annealing in air at temperatures ranging from 300-600 °C.
- Characterization using X-ray diffraction (XRD), atomic force microscopy (AFM), and UV-visible spectrophotometry.
Main Results:
- Polycrystalline NiO films with face-centered cubic (f.c.c.) structure were obtained.
- Microstructure analysis revealed ellipsoidal and nano-rod formations.
- Optical studies showed high transmittance (80-95%) and a tunable energy band gap (3.66-3.83 eV).
Conclusions:
- Annealing temperature and molarity significantly impact NiO thin film properties.
- The observed band gap variations are attributed to crystallite size reduction.
- NiO thin films demonstrate promising optical properties for potential applications.
