Ultrasmooth silver thin films deposited with a germanium nucleation layer

Logeeswaran Vj1, Nobuhiko P Kobayashi, M Saif Islam

  • 1Department of Electrical & Computer Engineering, Kemper Hall, University of California at Davis, One Shields Avenue, Davis, California 95616, USA.

Nano Letters
|December 25, 2008
PubMed
Summary

A new method uses a germanium seed layer to deposit smooth, highly conductive silver films on silicon dioxide/silicon substrates. This technique significantly improves surface roughness for applications in nanophotonics and plasmonics.

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