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Related Concept Videos

Newman Projections02:06

Newman Projections

Different notations are used to represent the three-dimensional structure of molecules on two-dimensional surfaces. One of the most commonly used representations is the dash-wedge formula. The dashed wedges, solid wedges, and the plane lines indicate the groups situated behind the plane, coming out of the plane, and in the plane, respectively.
The organic molecules rotate across the single bonds leading to numerous temporary three-dimensional structures of varying energy known as conformers.
Three-Dimensional Microscopy in Microbiology01:28

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Three-dimensional imaging techniques are essential in cell biology, allowing researchers to visualize intricate cellular structures with high resolution. Two prominent methods, Differential Interference Contrast Microscopy (DIC) and Confocal Scanning Laser Microscopy (CSLM), provide distinct advantages for imaging live and thick specimens, respectively.Differential Interference Contrast MicroscopyDIC microscopy enhances contrast in transparent, unstained samples by converting phase...
Fischer Projections02:18

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Learning to draw Fischer projections of molecules and understanding their relevance plays a crucial role in the visual depiction of organic molecules. A Fischer projection is a two-dimensional projection on a planar surface to simplify the three-dimensional wedge–dash representation of molecules. This is especially helpful in the case of molecules with multiple chiral centers that can be difficult to draw. Here, all the bonds of interest are represented as horizontal or vertical lines. While...
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Molecular Models02:00

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Updated: Jun 26, 2026

3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry
07:10

3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry

Published on: April 29, 2020

Three-dimensional depth profiling of molecular structures.

A Wucher1, J Cheng, L Zheng

  • 1Fachbereich Physik, Universität Duisburg-Essen, 47048, Duisburg, Germany. andreas.wucher@uni-due.de

Analytical and Bioanalytical Chemistry
|January 21, 2009
PubMed
Summary
This summary is machine-generated.

This study combines molecular time of flight secondary ion mass spectrometry (ToF-SIMS) imaging with ion beam erosion for 3D chemical analysis. We show that this method can assess sputter depth profiling artifacts and achieve near-physical depth resolution limits.

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Last Updated: Jun 26, 2026

3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry
07:10

3D Depth Profile Reconstruction of Segregated Impurities Using Secondary Ion Mass Spectrometry

Published on: April 29, 2020

Three-dimensional Imaging of Bacterial Cells for Accurate Cellular Representations and Precise Protein Localization
06:33

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Published on: October 29, 2019

Area of Science:

  • Materials Science
  • Analytical Chemistry
  • Surface Science

Background:

  • Sputter depth profiling is crucial for analyzing thin films.
  • Artifacts like erosion rate variations can limit depth resolution.
  • Molecular time of flight secondary ion mass spectrometry (ToF-SIMS) offers high chemical sensitivity.

Purpose of the Study:

  • To develop and validate a 3D chemical analysis method for molecular films.
  • To assess artifacts inherent in sputter depth profiling.
  • To determine the achievable depth resolution using combined ToF-SIMS and ion beam erosion.

Main Methods:

  • Combining ToF-SIMS imaging with cluster ion beam erosion.
  • Utilizing a test structure with a trehalose film on silicon.
  • Analyzing the resulting dataset to evaluate depth resolution and artifacts.

Main Results:

  • The combined technique enables three-dimensional chemical analysis of molecular films.
  • Artifacts arising from lateral inhomogeneities were assessed.
  • Demonstrated that local depth resolution approaches the physical limit set by ToF-SIMS information depth.

Conclusions:

  • The integrated ToF-SIMS and ion beam erosion approach is effective for 3D chemical analysis.
  • This method allows for the critical assessment of sputter depth profiling artifacts.
  • Near-physical depth resolution limits can be achieved, improving the accuracy of thin film analysis.