Photooxidation of water by NiTiO3 deposited from single source precursor [Ni2Ti2(OEt)2(micro-OEt)6(acac)4] by AACVD

A single-source heterobimetallic complex Ni2Ti2(OEt)2(mu-OEt)6(acac)4 (1) (acac=2,4-pentanedionate), having a low decomposition temperature and sufficient solubility in organic solvents, was synthesized by simple chemical techniques in high yield and analyzed by melting point, FTIR, single crystal X-ray analysis and thermal analysis. The TGA analysis proved that complex (1) underwent facile thermal decomposition at 500 degrees C to give NiTiO3 residue. In-house designed aerosol assisted chemical vapor deposition equipment was used to deposit high quality thin films of NiTiO3 on a SnO2 coated conducting glass substrate at 500 degrees C. An XRD analysis of the thin films proved the formation of crystalline NiTiO3 with average grain size 42 nm. Scanning electron microscopic studies (SEM) show that the thin films consist of flat, plate-like nanoparticles. The current-potential characteristics recorded under AM1.5 illumination indicate that NiTiO3 thin films are anodic and the photocurrent density at 1.23 V vs RHE (Reversible Hydrogen Electrode) is about 40 microA cm(-2).