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Published on: November 15, 2013
Gold removal from germanium nanowires
Joshua B Ratchford1, Irene A Goldthorpe, Yun Sun
1Department of Chemistry, Stanford University, Stanford, California 94305-5080, USA.
Researchers selectively removed 99% of gold nanoparticles (AuNPs) from germanium nanowire (GeNW) tips using hydrochloric acid solutions. This process preserved the germanium surface integrity, enabling cleaner GeNW growth for advanced applications.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Chemistry
Background:
- Germanium nanowires (GeNWs) are crucial for nanoelectronic devices.
- Growth of GeNWs often involves gold nanoparticles (AuNPs) as catalysts.
- Residual AuNPs can negatively impact device performance and require removal.
Purpose of the Study:
- To develop a selective and efficient method for removing AuNPs from GeNW tips.
- To ensure the germanium surface remains unoxidized after gold removal.
- To investigate methods for improving the selectivity of GeNW growth on AuNPs.
Main Methods:
- Selective etching of AuNPs using aqueous hydrochloric acid solutions with potassium triiodide or iodine.
- Quantification of residual gold using inductively coupled plasma-mass spectrometry (ICP-MS).
- Surface analysis using photoemission spectroscopy (PES) and Auger electron spectroscopy (AES).
Main Results:
- Achieved 99% removal of residual gold atoms from GeNW tips.
- PES confirmed no significant oxidation of germanium surfaces post-etching.
- AES revealed germanium incorporation in non-yielding AuNPs and enhanced GeNW selectivity with gaseous HCl addition.
Conclusions:
- Aqueous hydrochloric acid solutions with iodide or triiodide are effective etchants for selective gold removal.
- The developed method preserves germanium surface quality, crucial for device fabrication.
- Optimizing precursor gases during chemical vapor deposition enhances the selectivity of germanium nanowire growth.
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