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Related Concept Videos

Interference and Diffraction02:18

Interference and Diffraction

Interference is a characteristic phenomenon exhibited by waves. When two electromagnetic waves interact with their peaks and troughs coinciding, a resulting wave with enhanced amplitude is produced. This is known as constructive interference. In this case, the two waves interacting are in phase with each other.

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Updated: Jun 22, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
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Four beams evanescent waves interference lithography for patterning of two dimensional features.

J K Chua, V M Murukeshan, S K Tan

    Optics Express
    |June 18, 2009
    PubMed
    Summary

    This study explores using evanescent wave interference for advanced lithography. The technique can create nanoscale patterns with resolution below one-third of the light source wavelength.

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    Published on: September 14, 2018

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    Published on: February 12, 2017

    Area of Science:

    • Optics and Photonics
    • Nanotechnology
    • Materials Science

    Background:

    • Evanescent waves are generated via total internal reflection.
    • Interference of light waves can create high-resolution patterns.
    • Existing lithography techniques face resolution limits.

    Purpose of the Study:

    • To theoretically investigate evanescent wave interference for 2D periodic feature fabrication.
    • To analyze the impact of polarization, incident angle, and phase shifting on interference patterns.

    Main Methods:

    • Formulation of 3D Cartesian expressions for evanescent waves.
    • Numerical simulations of evanescent wave interference.
    • Analysis of wave parameters like polarization and incident angle.

    Main Results:

    • Demonstrated the theoretical feasibility of using evanescent wave interference for lithography.
    • Identified key parameters influencing interference patterns.
    • Achieved simulated resolution below one-third of the irradiation source wavelength.

    Conclusions:

    • Evanescent wave interference is a promising technique for high-resolution 2D periodic feature fabrication.
    • The study provides a theoretical framework for optimizing this lithography method.