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Micro knife-edge optical measurement device in a silicon-on-insulator substrate
1Department of Electrical and Control Engineering, National Chiao Tung University, Taiwan, Republic of China. yichiu@mail.nctu.edu.tw
Optics Express
|June 24, 2009
Summary
We developed a micro knife-edge scanner using micro-electromechanical-system technology for precise laser beam characterization. This integrated device enables on-chip optical spot profile measurement, enhancing optical metrology capabilities.
Area of Science:
- Optoelectronics
- Micro-electromechanical systems (MEMS)
Background:
- The knife-edge method is standard for optical profile characterization.
- Existing methods can be limited in integration and precision.
Purpose of the Study:
- To present a novel micro knife-edge scanner fabricated using MEMS technology.
- To demonstrate integrated optical spot profile measurement capabilities.
Main Methods:
- Fabrication of a micro knife-edge scanner on a silicon-on-insulator substrate.
- Utilizing micro-electromechanical-system technology for device construction.
- Implementing a novel backside deep reactive ion etching process to mitigate residual stress.
Main Results:
- Successful fabrication of a micro knife-edge scanner.
- Demonstration of focused optical spot profile measurement.
- Potential for integrated photodetector and signal conditioning circuitry.
Conclusions:
- The developed MEMS micro knife-edge scanner offers a compact and integrated solution for optical profile characterization.
- The novel etching process effectively addresses residual stress issues in MEMS devices.
- This technology advances on-chip optical metrology for laser beam analysis.
