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Updated: Jun 19, 2026

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope
10:25

Single-Digit Nanometer Electron-Beam Lithography with an Aberration-Corrected Scanning Transmission Electron Microscope

Published on: September 14, 2018

Ultrahigh-vacuum third-order spherical aberration (Cs) corrector for a scanning transmission electron microscope

Kazutaka Mitsuishi1, Masaki Takeguchi, Yukihito Kondo

  • 1High-Voltage Electron Microscopy Station, National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan. Mitsuishi.Kazutaka@nims.go.jp

Microscopy and Microanalysis : the Official Journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada
|October 17, 2009
PubMed

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