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Updated: Jun 19, 2026

A Standard and Reliable Method to Fabricate Two-Dimensional Nanoelectronics
Published on: August 28, 2018
TEM sample preparation using a new nanofabrication technique combining electron-beam-induced deposition and
Kazutaka Mitsuishi1, Masayuki Shimojo, Miyoko Tanaka
1National Institute for Materials Science, 3-13 Sakura, Tsukuba, Ibaraki 305-0003, Japan. Mitsuishi.Kazutaka@nims.go.jp
Abstract:
A new TEM sample preparation technique using electron-beam-induced deposition combined with low-energy ion milling was used to fabricate for two different shapes of sample, conical and plate. High-quality HREM images can be obtained from samples prepared by this technique. A desired sample position can be obtained with high accuracy, and the total sample preparation time can be much less than conventional techniques. Because the gas deposition system used can easily be integrated in a conventional SEM, the method can be performed in any laboratory equipped with a SEM and an ion milling machine.
