Silicon dioxide embedded germanium nanocrystals grown using molecular beam epitaxy for floating gate memory devices

S Das1, R K Singha, K Das

  • 1Department of Physics and Meteorology, Indian Institute of Technology, Kharagpur 721302, India.

Summary

This study fabricated silicon dioxide/germanium nanocrystal/silicon dioxide memory structures. The research confirmed net electron trapping in germanium nanocrystals, crucial for advanced memory devices.