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Self-masked high-aspect-ratio polymer nanopillars
Ming-Hung Chen1, Yun-Ju Chuang, Fan-Gang Tseng
1Institute of NanoEngineering and MicroSystems, National Tsing Hua University, Hsinchu 30013, Taiwan, Republic of China.
Nanotechnology
|November 28, 2009
Summary
A new self-masked high-aspect-ratio polymer nanopillars fabrication (SMHAR) process uses reactive ion etching to create uniform nanopillars on diverse polymers. This cost-effective method is suitable for applications in nano/micro-electromechanical systems and lab-on-a-chip devices.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Engineering
Background:
- Fabricating high-aspect-ratio nanopillars on polymers is crucial for advanced applications.
- Existing methods often lack cost-effectiveness, universality, or scalability.
Purpose of the Study:
- To propose a simple, cost-effective, and universal method for creating high-aspect-ratio nanopillars on various polymers.
- To demonstrate the manipulation of nanopillar dimensions and distribution.
- To validate the method's applicability on different polymer substrates.
Main Methods:
- Direct reactive ion etching (RIE) utilizing self-formed nanomasks from a dummy material (cover glass).
- Characterization using X-ray photoelectron microscopy (XPS) and Auger electron microscopy (AES).
- Optimization of etching time and dummy material configuration.
Main Results:
- Achieved a maximum structural aspect ratio of 60 (6.7 µm high, 112 nm thick nanopillars) on Parylene C via a 60-min SMHAR process.
- Successfully generated nanopillars on poly(dimethylsiloxane) (PDMS) and SU-8 photoresist.
- Demonstrated control over nanopillar distribution and dimensions by adjusting process parameters.
Conclusions:
- The proposed self-masked high-aspect-ratio polymer nanopillars fabrication (SMHAR) process is a versatile and efficient technique.
- This method enables the creation of nanostructured polymers for lab-on-a-chip (LOC) and nano/micro-electromechanical systems (N/MEMS).
- The process offers a scalable and cost-effective solution for producing tailored polymer nanostructures.
