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Large-area maskless surface plasmon interference for one- and two-dimensional periodic nanoscale feature patterning.

K V Sreekanth¹, V M Murukeshan

¹School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore.

Journal of the Optical Society of America. A, Optics, Image Science, and Vision

|December 26, 2009

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A novel maskless nanoscale lithography technique uses surface plasmon interference for single-exposure patterning. This method achieved 90 nm grating and pillar features over large areas, demonstrating its potential for advanced nanofabrication.

Area of Science:

Nanotechnology
Optical Lithography
Materials Science

Background:

Traditional lithography often requires complex masks and multiple exposure steps.
Achieving high-resolution nanoscale patterns over large areas remains a significant challenge in nanofabrication.

Purpose of the Study:

To propose and experimentally demonstrate a maskless surface-plasmon-interference nanoscale lithography technique.
To achieve precise patterning of both one-dimensional and two-dimensional nanostructures with high resolution.

Main Methods:

Utilized a 364 nm illumination wavelength source.
Employed a custom-made prism layer configuration to generate surface plasmon interference.
Achieved single-exposure patterning on a photoresist layer.

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Main Results:

Successfully patterned one-dimensional (grating-type) and two-dimensional (pillar-type) nanoscale features.
Realized large-area patterns with feature sizes of approximately 90 nm.
Demonstrated the efficacy of the maskless surface-plasmon-interference technique.

Conclusions:

The developed maskless surface-plasmon-interference lithography is a promising technique for high-resolution nanofabrication.
The method enables efficient, single-exposure patterning of complex nanostructures.
This approach offers a viable alternative for large-area nanoscale feature fabrication.