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Published on: July 18, 2018
Cross-linkable molecular glasses: low dielectric constant materials patternable in hydrofluoroethers
Eisuke Murotani1, Jin-Kyun Lee, Margarita Chatzichristidi
1Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA.
ACS Applied Materials & Interfaces
|April 2, 2010
Summary
Researchers developed new solution-processable low-dielectric-constant (low-k) materials. These semiperfluorinated molecular glasses enable photolithographic patterning using eco-friendly solvents, offering excellent thermal stability and low dielectric properties.
Area of Science:
- Materials Science
- Organic Chemistry
- Nanotechnology
Background:
- Development of low-dielectric-constant (low-k) materials is crucial for advanced microelectronics.
- Existing low-k materials often face challenges with processability and environmental impact.
Purpose of the Study:
- To synthesize and characterize novel solution-processable low-k materials.
- To enable photolithographic patterning of these materials using environmentally benign solvents.
- To achieve low dielectric constants and good film-forming properties.
Main Methods:
- Synthesis of semiperfluorinated molecular glasses with styrenic substituents.
- Thermal stability analysis using thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC).
- Film characterization using atomic force microscopy (AFM).
- Dielectric constant measurement via capacitance measurements.
- Photolithographic patterning in hydrofluoroether (HFE) solvents.
Main Results:
- Synthesized thermally stable (up to 400°C) amorphous molecular glasses.
- Achieved low dielectric constants of 2.6-2.8 at 100 kHz.
- Demonstrated successful cross-linking in the presence of acid, forming robust, uniform, and pinhole-free films.
- Confirmed the effectiveness of semiperfluorinated substituents, especially fluorinated alkyl ether structures, in reducing dielectric constant.
- Enabled submicrometer scale photolithographic patterning in HFEs due to good solubility.
Conclusions:
- A new class of solution-processable low-k materials based on semiperfluorinated molecular glasses has been developed.
- These materials offer a promising combination of low dielectric constant, thermal stability, and processability.
- The developed materials are suitable for photolithographic patterning using environmentally friendly solvents, advancing microelectronic fabrication.
