A new aberration-corrected, energy-filtered LEEM/PEEM instrument. I. Principles and design

R M Tromp1, J B Hannon, A W Ellis

  • 1IBM T.J. Watson Research Center, 1101 Kitchawan Road, P.O. Box 218, Yorktown Heights, NY 10598, USA. rtromp@us.ibm.com

Ultramicroscopy
|April 17, 2010
PubMed

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