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Syntheses, X-ray structures and CVD of titanium(IV) arsine complexes
Tegan Thomas1, David Pugh, Ivan P Parkin
1Materials Chemistry Centre, Department of Chemistry, University College London, Gordon St., London, WC1H OAJ, England.
Dalton Transactions (Cambridge, England : 2003)
|May 12, 2010
Summary
New titanium arsine compounds were synthesized, including adducts and a novel compound with titanium-arsenic linkage. Decomposition studies explored their potential in chemical vapor deposition.
Area of Science:
- Organometallic Chemistry
- Coordination Chemistry
- Materials Science
Background:
- Titanium tetrachloride (TiCl4) is a versatile precursor in organometallic synthesis.
- Arsine ligands offer unique electronic and steric properties for coordination complexes.
- Understanding the synthesis and properties of titanium-arsine compounds is crucial for developing new materials.
Purpose of the Study:
- To synthesize and characterize novel titanium arsine compounds.
- To investigate the structural features of these compounds, including Ti-As bonding.
- To explore the decomposition behavior of synthesized compounds for potential applications in chemical vapor deposition (CVD).
Main Methods:
- Synthesis of titanium arsine compounds via reactions of TiCl4 with various arsines (AsPh3, Ph2AsCH2AsPh2, tBuAsH2, As(NMe2)3).
- Isolation and characterization of 1:1 and 1:2 adducts.
- X-ray crystallography to determine the crystal structures of key compounds.
- Thermogravimetric analysis (TGA) to study decomposition.
- Aerosol-assisted and low-pressure chemical vapor deposition (CVD) to evaluate decomposition products.
Main Results:
- Five titanium arsine compounds were successfully synthesized.
- Characterization confirmed the formation of 1:1 and 1:2 adducts of the type [TiCl4(L)n].
- A novel compound, [TiCl3(NMe2)(μ-NMe2)2AsCl], was formed through ligand exchange, featuring a Ti-As linkage via bridging NMe2 groups.
- Crystal structures of [TiCl4(AsPh3)] and [TiCl4(AsPh3)2] revealed Ti-As bond lengths of 2.7465(13) Å and 2.7238(7) Å, respectively.
- Decomposition studies using TGA and CVD demonstrated the potential of these compounds as precursors.
Conclusions:
- The study successfully synthesized and structurally characterized a range of titanium arsine compounds.
- A novel Ti-As bonded compound was discovered, highlighting unique reactivity pathways.
- The investigated compounds show promise as precursors for thin film deposition via CVD techniques.
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