Characterization of oxide scales thermally formed on single-crystal silicon carbide

Microstructures of oxide scales thermally formed on single-crystal silicon carbide were investigated using transmission electron microscopy. The oxide scales were formed on the Si-face of 6H-SiC at 1273-1473 K in dry oxygen. Spherical patterns were observed on the surfaces of the oxidized samples by an optical microscope in some regions. In these regions, cross-sectional transmission electron microscopy (TEM) observations show that the oxide scale was divided into two layers; the upper layer (surface side) was composed of crystalline silica, and the lower layer on the silicon carbide substrate was amorphous silica, while the oxide scales in the surroundings of the patterns were composed of only amorphous silica. The oxidation activation energy in the amorphous silica layer of the Si-face of 6H-SiC was found to be 408 kJ/mol by the evolution of thickness directly measured from the cross-sectional scanning electron microscopy and TEM images.