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Updated: Jun 11, 2026
Fabrication and Characterization of High-Q Silicon Nitride Membrane Resonators
Published on: August 8, 2025
Fabrication of antireflective sub-wavelength structures on silicon nitride using nano cluster mask for solar cell
Kartikachandra Sahoo1, Men-Ku Lin, Edward-Yi Chang
1Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu, Taiwan. edc@mail.nctu.edu.tw.
Abstract:
We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160-200 nm and a height of 140-150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen.
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