Deposition error compensation for optical multilayer coatings. II. Experimental results-sputtering system
Applied Optics
|September 8, 2010
Summary
This study introduces an automated magnetron-sputtering system for creating complex optical multilayer structures. The system precisely controls layer thickness in real-time, enabling the fabrication of advanced all-dielectric filters with high accuracy.
Area of Science:
- Materials Science
- Optical Engineering
- Thin Film Deposition
Background:
- Fabricating complex optical multilayer structures requires precise control over layer thickness.
- Existing methods may lack the automation and real-time feedback necessary for intricate designs.
Purpose of the Study:
- To describe a fully automated magnetron-sputtering system for depositing complicated optical multilayer structures.
- To demonstrate the system's capability in producing high-performance all-dielectric filters.
Main Methods:
- Utilized a fully automated magnetron-sputtering system.
- Implemented real-time determination of deposited layer thicknesses.
- Adjusted remaining layer thicknesses to reoptimize performance.
Main Results:
- Successfully fabricated five complex multilayer systems.
- Demonstrated close agreement between theoretical and measured spectral transmittance.
- Achieved unattended operation for extended periods (24h+).
Conclusions:
- The developed system enables the production of virtually any designed all-dielectric filter.
- The system offers high precision and reliability for advanced optical coatings.
- The automated process ensures consistent performance and broad spectral accuracy.
