Fast plasma discharge capillary design as a high power throughput soft x-ray emission source

E S Wyndham1, M Favre, M P Valdivia

  • 1Facultad de Física, Pontificia Universidad Católica de Chile, Ave. Vicuña Mackenna 4860, Santiago, Chile. ewyndham@fis.puc.cl

Summary

We developed a compact, high-repetition-rate plasma capillary source for extreme ultraviolet and soft X-ray research. This low-energy system offers efficient operation for advanced applications.