High temperature stability of multicomponent TiAlSiN and CrAlSiN coatings

The high temperature oxidation behavior of TiAlSiN and CrAlSiN coatings was studied. These coatings were deposited on silicon substrates by using a cathodic-arc deposition system with lateral rotating arc cathodes. Titanium, chromium and Al88Si12 cathodes were used for the deposition of TiAlSiN and CrAlSiN coatings. All the deposited Ti(0.49)Al(0.44)Si(0.07)N, Ti(0.41)Al(0.51)Si(0.08)N and Cr(0.50)Al(0.440Si(0.06)N coatings showed B1-NaCl crystal structure and possessed nano-grain sizes of 6-8 nm. For the high temperature oxidation test, the coated samples were annealed at 900 degrees C in air for 2 hours. The Ti(0.41)Al(0.51)Si(0.08)N with higher Al and Si contents possessed lower oxidation rate than that of Ti(0.49)Al(0.44)Si(0.07)N. The oxide layer formed on the Ti(0.49)Al(0.44)Si(0.07)N coatings consisted of large TiO2 and TiAlSiN grains at the oxide-coating interface, followed by a layer of Al2O3 in the near-surface region. The oxidation rate of the Cr(0.50)Al(0.44)Si(0.06)N coated sample was much lower than that of the Ti(0.49)Al(0.44)Si(0.07)N and Ti(0.41)Al(0.51)Si(0.08)N. The dense Al2O3 with amorphous top layer at the oxide-coating interface retarded the diffusion of oxygen into the Cr(0.50)Al(0.44)Si(0.06)N. The deposited Cr(0.50)Al(0.44)Si(0.06)N showed a high temperature performance superior to those of the Ti(0.49)Al(0.44)Si(0.07)N and Ti(0.41)Al(0.51)Si(0.08)N.