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Published on: October 2, 2012
Fitting-determined formulation of effective medium approximation for 3D trench structures in model-based infrared
Chuanwei Zhang1, Shiyuan Liu, Tielin Shi
1Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, Hubei, 430074, China.
This study introduces a new fitting-determined effective medium approximation (FD-EMA) for modeling 3D trench structures in model-based infrared reflectrometry (MBIR). The FD-EMA significantly improves metrology accuracy for complex 3D structures.
Area of Science:
- Materials Science
- Metrology
- Optical Engineering
Background:
- Model-based infrared reflectrometry (MBIR) is crucial for metrology.
- Accurate modeling of 3D trench structures for MBIR remains a challenge.
- Existing models struggle with the complexity of 3D geometries.
Purpose of the Study:
- To develop a simplified and accurate EMA formulation for 3D trench structures.
- To enhance the precision of MBIR metrology for complex geometries.
- To ensure the general applicability of the proposed model.
Main Methods:
- Developed a fitting-determined effective medium approximation (FD-EMA) formulation.
- Investigated the generality of FD-EMA across varying trench depths, pitches, and incidence angles.
- Validated the FD-EMA model using simulations on a taper trench structure.
Main Results:
- The proposed FD-EMA formulation provides a simplified model for 3D trench structures.
- FD-EMA demonstrated generality for various trench configurations.
- MBIR metrology using the FD-EMA model achieved a one-order higher accuracy compared to conventional EMA.
Conclusions:
- The FD-EMA formulation offers a significant advancement in modeling 3D trench structures for MBIR.
- This method enhances the accuracy and applicability of infrared metrology for complex 3D features.
- The findings pave the way for more precise metrology in microelectronics fabrication.
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