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Methods for vertical drift measurements of scanning probe microscopes
Dun Niu1, Yuhang Chen, Wenhao Huang
1Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei, Anhui 230027, P. R. China.
Summary
This study introduces a new method to measure vertical drift in scanning probe microscopes (SPMs), accounting for lateral drift. Results reveal significant and varied vertical drift, crucial for SPM instrument stability.
Area of Science:
- Scientific instrumentation
- Surface science and metrology
Background:
- Time stability is critical for scanning probe microscope (SPM) applications.
- While closed-loop systems minimize drift, residual lateral and vertical drift persist.
- Existing methods for measuring lateral drift are well-established, but vertical drift measurement is challenging due to coupling effects.
Purpose of the Study:
- To develop and validate a novel method for measuring vertical drift in SPMs.
- To address the challenge of isolating and quantifying vertical drift, considering lateral drift influences.
- To provide a means for evaluating the vertical instability of SPM instruments.
Main Methods:
- A new method based on analyzing scanned topography images is proposed.
- The technique explicitly incorporates the influence of lateral drift into the vertical drift calculation.
- Experimental validation was performed using the developed method.
Main Results:
- The vertical drift of SPM instruments is demonstrated to be non-negligible.
- Vertical drift is found to vary across different pixels within a single scanned image.
- The proposed method successfully revealed and quantified pixel-specific vertical drift.
Conclusions:
- The developed method provides an effective means to measure vertical drift in SPMs.
- Understanding and quantifying vertical drift is essential for improving SPM accuracy and reliability.
- This work highlights the importance of evaluating vertical instrument instability for advanced SPM applications.
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