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Optimized piranha etching process for SU8-based MEMS and MOEMS construction.

Matthew Holmes1, Jared Keeley, Katherine Hurd

  • 1ECE Department, Brigham Young University, 459 Clyde Building, Provo, UT 84602, USA.

Journal of Micromechanics and Microengineering : Structures, Devices, and Systems
|March 23, 2011
PubMed
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We optimized piranha (H(2)O(2):H(2)SO(4)) mixtures for fast etching of hollow SU8 polymer structures. This method is effective for microfabrication materials and creating hollow optical waveguides.

Area of Science:

  • Materials Science
  • Chemical Engineering
  • Nanotechnology

Background:

  • Microfabrication relies on precise etching processes.
  • SU8 polymer is a common material for sacrificial cores in microstructures.
  • Piranha mixtures are potent etchants but require careful optimization.

Purpose of the Study:

  • To optimize piranha mixture parameters (concentration, temperature, cycling) for efficient etching of SU8 polymer.
  • To investigate the impact of the optimized piranha mixture on key properties of microfabrication materials.
  • To demonstrate the utility of the optimized etching process in fabricating hollow optical waveguides.

Main Methods:

  • Systematic variation of piranha mixture concentrations, temperatures, and cycling protocols.

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  • Etching of highly crosslinked SU8 polymer sacrificial cores.
  • Characterization of etched structures and analysis of material properties (thickness, refractive index, roughness) of SiN, SiO(2), and Si.
  • Fabrication of hollow anti-resonant reflecting optical waveguides using the optimized process.

    • Main Results:

    • Identified optimal piranha mixture conditions for high-yield, rapid etching of SU8 cores.
    • Quantified the effects of the piranha mixture on the thickness, refractive index, and roughness of SiN, SiO(2), and Si.
    • Successfully fabricated functional hollow anti-resonant reflecting optical waveguides, demonstrating the process's effectiveness.

    Conclusions:

    • The optimized piranha etching process provides a rapid and effective method for creating hollow microstructures.
    • The process minimally impacts critical material properties essential for micro-electromechanical systems and micro-opto-electromechanical systems.
    • This work enables advanced fabrication of complex hollow optical devices.