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Synthesis of Monodisperse Cylindrical Nanoparticles via Crystallization-driven Self-assembly of Biodegradable Block Copolymers
Published on: June 20, 2019
Aligned nanowires and nanodots by directed block copolymer assembly
Shuaigang Xiao1, XiaoMin Yang, Kim Y Lee
1Seagate Technology, Fremont, CA 94538, USA. shuaigang.xiao@seagate.com
Directed self-assembly of block copolymers (BCPs) creates ordered sub-10 nm nanostructures. Surface patterning precisely controls BCP microdomain arrangement, enabling nanowire or nanodot arrays without substrate modification.
Area of Science:
- Materials Science
- Nanotechnology
- Polymer Science
Background:
- Block copolymers (BCPs) self-assemble into ordered nanostructures.
- Directed self-assembly (DSA) offers precise control over nanostructure formation.
- Sub-10 nm feature generation is crucial for advanced electronics and photonics.
Purpose of the Study:
- To investigate the directed self-assembly of block copolymers (BCPs) using surface patterning.
- To explore the manipulation of BCP microdomain ordering and orientation.
- To understand the effects of lattice commensurability and mismatch on BCP nanostructures.
Main Methods:
- Utilizing surface patterning to guide the lateral ordering of BCP microdomains.
- Comparing commensurate and incommensurate lattice arrangements between surface patterns and BCP natural periods.
- Analyzing the influence of lattice mismatch and pattern amplification on BCP feature size, shape, and pitch.
Main Results:
- Achieved ultradense arrays of spherical or cylindrical BCP microdomains.
- Demonstrated control over BCP microdomain arrangement into 1D nanowires or 2D nanodots via commensurability.
- Showcased the impact of lattice mismatch, including skew angles, on BCP chain stretching/compression and resulting nanostructures.
Conclusions:
- Surface patterning is an effective strategy for directed self-assembly of BCPs into ordered nanostructures.
- Commensurability and lattice mismatch offer tunable control over BCP nanostructure dimensions and arrangement.
- This approach provides a transparent method to study and engineer sub-10 nm features without substrate modification.
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