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The Effect of Anodization Parameters on the Aluminum Oxide Dielectric Layer of Thin-Film Transistors
Published on: May 24, 2020
Kenji Nomura1, Toshio Kamiya, Hideo Hosono
1Frontier Research Center, Tokyo Institute of Technology, Midori-ku, Yokohama, Japan. nomura@lucid.msl.titech.ac.jp
No abstract available in PubMed .