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Updated: May 30, 2026
Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
High resolution radially symmetric nanostructures from simultaneous electron beam induced etching and deposition
Charlene J Lobo1, Milos Toth, Raymond Wagner
1College of Nanoscale Science and Engineering, State University of New York at Albany, 251 Fuller Road, Albany, NY 12203, USA. Microstructural Analysis Unit, University of Technology, Sydney, Broadway, NSW 2007, Australia.
Simultaneous electron beam induced etching and deposition (EBIED) overcomes resolution limits by using adsorbate depletion. This technique enables precise fabrication of sub-1 nm nanostructures, ideal for advanced applications.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Science
Background:
- Electron beam induced etching (EBIE) and deposition (EBID) are key nanofabrication techniques.
- Current methods are limited by electron flux distribution, impacting spatial resolution.
Purpose of the Study:
- To introduce simultaneous EBIE and EBID (EBIED) for enhanced spatial resolution.
- To demonstrate a method for fabricating nanostructures beyond current resolution limits.
Main Methods:
- Utilizing adsorbate depletion within the electron flux profile.
- Employing simulations to model the EBIED process and its outcomes.
Main Results:
- Achieved simultaneous etching and deposition in adjacent regions.
- Demonstrated potential for sub-1 nm scale growth control of radially symmetric nanostructures.
- Simulations indicate feasibility of fabricating ring-shaped nanostructures.
Conclusions:
- EBIED surpasses traditional resolution limits in electron beam nanofabrication.
- The technique is suitable for creating nanostructures for plasmonics, sensing, and magnetoelectronics.
- Offers precise control for advanced nanoscale device fabrication.
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