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Updated: May 30, 2026

Focused Ion Beam Lithography to Etch Nano-architectures into Microelectrodes
Published on: January 19, 2020
Ion beam shaping and downsizing of nanostructures
M Zgirski1, K-P Riikonen, V Tuboltsev
1NanoScience Center, Department of Physics, University of Jyväskylä, PB 35, FI-40014 Jyväskylä, Finland.
Abstract:
We report a new approach for progressive and well-controlled downsizing of nanostructures below the 10 nm scale. A low energetic ion beam (Ar(+)) is used for gentle surface erosion, progressively shrinking the dimensions with ∼1 nm accuracy. The method enables shaping of the nanostructure geometry and polishing of the surface. The process is clean room/high vacuum compatible being suitable for various applications. Apart from technological advantages, the method enables the study of various size phenomena on the same sample between sessions of ion beam treatment.

