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Updated: May 30, 2026

Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
Published on: May 28, 2016
Ion beam nanopatterning in graphite: characterization of single extended defects
P Mélinon1, A Hannour, L Bardotti
1Laboratoire de la Matière Condensée et Nanostructures UMR 5586, Université de Lyon, Université Lyon I et CNRS, Bâtiment Lon Brillouin, 6 rue Ampère, Domaine de la Doua, F-69622 Villeurbanne, France.
Abstract:
The morphology and the electronic structure of a single focused ion-beam-induced artificial extended defect is probed by several methods including micro-Raman spectroscopy, atomic force and scanning tunneling microscopies and Monte Carlo and/or semi-analytical simulation within standard codes. The efficiency of the artificial defect for deposited metallic cluster pinning is also investigated. We show a correlation between the ion dose, morphology, electronic structure and cluster trapping efficiency. At room temperature, cluster pinning is efficient when the displacement per atom is one or more. Well-ordered patterned cluster networks are considered for potential applications.

