Ru cyclooctatetraene precursors for MOCVD

Tatsuya Ando1, Naoki Nakata, Kazuharu Suzuki

  • 1Department of Chemistry and Biochemistry, Graduate School of Engineering, Kyushu University, 744 Moto-oka, Nishi-ku, Fukuoka 819-0395, Japan.

Summary

New ruthenium (Ru) cyclooctatetraene complexes offer optimal properties for metal organic chemical vapor deposition (MOCVD) applications. These compounds enable the deposition of highly conformal Ru thin films, even in high aspect ratio structures.

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