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Updated: May 27, 2026
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Determination of the Excitation and Coupling Rates Between Light Emitters and Surface Plasmon Polaritons
Published on: July 21, 2018
Performance enhancements to absorbance-modulation optical lithography. I. Plasmonic reflector layers.
John E Foulkes1, Richard J Blaikie
1MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Electrical and Computer Engineering, University of Canterbury, Christchurch, New Zealand.
Summary
A plasmonic reflector layer enhances optical lithography by improving image depth. While it extends confinement to 60 nm, it increases the intensity profile width by up to 50%.
Area of Science:
- Optics
- Materials Science
- Nanotechnology
Background:
- Optical lithography faces challenges in transmission and intensity profile control.
- Plasmonic materials offer potential solutions for enhancing optical processes.
- Previous work explored absorbance-modulation optical lithography.
Purpose of the Study:
- To investigate the impact of a plasmonic reflector layer (PRL) on optical lithography.
- To evaluate the improvement in transmission and intensity profiles using a PRL.
- To assess the PRL's effect on depth of focus and image confinement.
Main Methods:
- A plasmonic reflector layer (PRL) was integrated beneath the photoresist layer.
- Surface plasmons were induced on the PRL to enhance image transmission.
- The study analyzed changes in depth of focus and intensity profiles.
Main Results:
- The PRL significantly improved the depth of focus.
- Image confinement was extended up to 60 nm due to surface plasmon induction.
- A trade-off was observed: a 50% increase in the minimum full width at half-maximum of the intensity profile.
Conclusions:
- A plasmonic reflector layer is a valuable tool for near-field lithography.
- PRLs can enhance depth of focus and image confinement in optical lithography.
- The benefits of PRLs must be weighed against potential increases in intensity profile width.
