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Performance enhancements to absorbance-modulation optical lithography. II. Plasmonic superlenses
John E Foulkes1, Richard J Blaikie
1MacDiarmid Institute for Advanced Materials and Nanotechnology, Department of Electrical and Computer Engineering, University of Canterbury, Christchurch, New Zealand.
Summary
Integrating plasmonic layers into absorbance-modulation optical lithography (AMOL) shows potential for improved light transmission. However, further material development is necessary for significant performance enhancements in this lithography technique.
Area of Science:
- Optics and Photonics
- Materials Science
- Nanotechnology
Background:
- Absorbance-modulation optical lithography (AMOL) is a technique used for precise pattern transfer.
- Improving light transmission and intensity profiles is crucial for enhancing AMOL performance.
- Plasmonic materials offer unique optical properties that could be leveraged in lithography.
Purpose of the Study:
- To investigate the integration of plasmonic metal layers into AMOL systems.
- To evaluate the impact of plasmonic layers on transmission and intensity profiles in AMOL.
- To explore the potential of plasmonic layers as near-field analogues of negative refraction materials for improved lithography.
Main Methods:
- A plasmonic layer was introduced between the absorbance-modulation layer and the photoresist layer in an AMOL setup.
- The optical transmission properties of the layered system were analyzed.
- The effect of plasmonic layer thickness (10-20 nm) on superlens performance and full width at half-maximum (FWHM) was studied.
- Dichroic filtering capabilities of the plasmonic layer for different wavelengths were assessed.
Main Results:
- Thin plasmonic layers (10-20 nm) demonstrated superlens-like behavior, enabling transmission.
- A ~50% increase in full width at half-maximum (FWHM) was observed with the optimal plasmonic layer thickness.
- The plasmonic layers provided dichroic filtering, achieving a 10-fold difference in transmitted intensity ratio between two wavelengths.
- Undesirable photoresist exposure was reduced due to selective wavelength transmission.
Conclusions:
- Plasmonic layers can be successfully interfaced with AMOL systems.
- The integration of plasmonic layers offers a method for controlling light transmission and reducing unwanted exposure.
- Further research and material optimization are required to fully realize substantial performance improvements in AMOL using plasmonic enhancement.
