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Updated: May 26, 2026
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Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
Single digit nanofabrication by step-and-repeat nanoimprint lithography
1aBeam Technologies, 5286 Dunnigan Court, Castro Valley, CA 94546, USA. cp@abeamtech.com
Nanotechnology
|December 14, 2011
Summary
This study introduces a new method for creating sub-10 nm nanoimprint templates using electron beam lithography and atomic layer deposition (ALD). This technique enables high-fidelity replication of nanostructures, advancing single-digit nanofabrication capabilities.
Area of Science:
- Materials Science
- Nanotechnology
- Lithography
Background:
- Fabricating nanoimprint templates with sub-10 nm patterns is challenging.
- Existing methods have limitations in achieving high fidelity at the nanoscale.
Purpose of the Study:
- To demonstrate a novel strategy for fabricating nanoimprint templates with sub-10 nm patterns.
- To extend the capabilities of step-and-repeat nanoimprint lithography for single-digit nanofabrication.
Main Methods:
- Combining electron beam lithography (EBL) and atomic layer deposition (ALD).
- Utilizing step-and-repeat nanoimprint lithography for nanostructure replication.
- Employing ALD for feature shrinkage and precise control.
Main Results:
- Successfully fabricated nanoimprint templates with sub-10 nm patterns.
- Achieved high-fidelity replication and transfer of nanostructures into functional materials.
- Identified a size-dependent deposition rate during the ALD feature shrinkage process.
Conclusions:
- The combined EBL and ALD strategy is effective for creating high-resolution nanoimprint templates.
- This approach enhances the utility of step-and-repeat nanoimprint lithography for single-digit nanofabrication.
- Understanding the size-dependent ALD rate is crucial for optimizing feature shrinkage.
