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Related Concept Videos

Transmission Electron Microscopy01:15

Transmission Electron Microscopy

In 1931, physicist Ernst Ruska—building on the idea that magnetic fields can direct an electron beam just as lenses can direct a beam of light in an optical microscope—developed the first prototype of the electron microscope. This development led to the development of the field of electron microscopy. In the transmission electron microscope (TEM), electrons are produced by a hot tungsten element and accelerated by a potential difference in an electron gun, which gives them up to 400 keV in...
Electron Microscope Tomography and Single-particle Reconstruction01:07

Electron Microscope Tomography and Single-particle Reconstruction

Transmission electron microscopy (TEM) can be used to determine the 3D structure of biological samples with the help of techniques such as electron microscope tomography and single-particle reconstruction. While single-particle reconstruction can examine macromolecules and macromolecular complexes in vitro conditions only, tomography permits the study of cell components or small cells in vivo.
Electron Tomography
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Overview of Electron Microscopy01:25

Overview of Electron Microscopy

The wavelengths of visible light ultimately limit the maximum theoretical resolution of images created by light microscopes. Most light microscopes can only magnify 1000X, and a few can magnify up to 1500X. Electrons, like electromagnetic radiation, can behave like waves, but with wavelengths of 0.005 nm, they produce significantly greater resolution up to 0.05 nm as compared to 500 nm for visible light. An electron microscope (EM) can create a sharp image that is magnified up to 2,000,000X.
Atomic Force Microscopy01:08

Atomic Force Microscopy

Atomic force microscopy (AFM) is a type of scanning probe microscopy that can analyze topographic details of various specimens like ceramics, glass, polymers, and biological samples. AFM offers over 1000 times more resolution than the optical imaging system. Images generated from AFM are three-dimensional surface profiles, offering an advantage over the flat, two-dimensional images from other imaging techniques.
The AFM Probe
The probe is regarded as the heart of any AFM setup and comprises the...
Total Internal Reflection Fluorescence Microscopy01:05

Total Internal Reflection Fluorescence Microscopy

Total internal reflection fluorescence microscopy or TIRF is an advanced microscopic technique used to visualize fluorophores in samples close to a solid surface with a higher refractive index, such as a glass coverslip. TIRF only allows fluorophores in proximity to the solid surface to be excited. When light from a medium with a lower refractive index (such as air) hits the glass coverslip at a critical angle, the light undergoes total internal reflection stead of passing through the glass.
Atomic Emission Spectroscopy: Instrumentation01:22

Atomic Emission Spectroscopy: Instrumentation

The instrumentation of atomic emission spectrometry (AES) involves various components, including atomization devices that convert samples into gas-phase atoms and ions. There are two main types of atomization devices: continuous and discrete atomizers.  Continuous atomizers, like plasmas and flames, introduce samples in a constant stream, while discrete atomizers inject individual samples using syringes or autosamplers. The most common discrete atomizer is the electrothermal atomizer.

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Related Experiment Video

Updated: May 24, 2026

Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis
07:24

Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis

Published on: May 10, 2021

40 keV atomic resolution TEM.

David C Bell1, Christopher J Russo, Dmitry V Kolmykov

  • 1School of Engineering and Applied Sciences, Harvard University, Cambridge, MA 02138, USA. dcb@seas.harvard.edu

Ultramicroscopy
|February 24, 2012
PubMed
Summary
This summary is machine-generated.

This study introduces low-voltage electron microscopy for atomic resolution imaging. Aberration correction and monochromation enable sub-angstrom resolution at 40 keV, improving contrast and reducing sample damage.

Related Experiment Videos

Last Updated: May 24, 2026

Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis
07:24

Quantitative Atomic-Site Analysis of Functional Dopants/Point Defects in Crystalline Materials by Electron-Channeling-Enhanced Microanalysis

Published on: May 10, 2021

Area of Science:

  • Materials Science
  • Physics
  • Electron Microscopy

Background:

  • Traditional electron microscopy often faces limitations in resolution and sample damage at higher voltages.
  • Low-voltage electron microscopy offers potential benefits like enhanced scattering and reduced knock-on damage.
  • Achieving atomic resolution at low voltages has been historically challenging due to aberration limits.

Purpose of the Study:

  • To demonstrate atomic resolution imaging at 40 keV using aberration-corrected, monochromated transmission electron microscopy (TEM).
  • To showcase the advantages of low-voltage high-resolution electron microscopy (LVHREM) for materials characterization.
  • To overcome the chromatic aberration limit at low voltages for improved imaging.

Main Methods:

  • Utilizing an aberration-corrected, monochromated source TEM operating at 40 keV.
  • Implementing low-voltage high-resolution electron microscopy (LVHREM) techniques.
  • Comparing experimental atomic resolution images with electron multislice simulations.

Main Results:

  • Achieved a usable high-resolution limit of less than 1 Å at 40 keV.
  • Demonstrated improved contrast-to-damage ratio for various samples.
  • Successfully imaged graphene and silicon at atomic resolution using the developed technique.

Conclusions:

  • Third-order aberration correction enables atomic resolution TEM at low energies.
  • Source monochromation effectively reduces chromatic aberration, pushing resolution limits.
  • LVHREM with advanced aberration correction is a powerful tool for high-resolution materials imaging with reduced damage.