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Related Concept Videos

Inductively Coupled Plasma Atomic Emission Spectroscopy: Principle01:19

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Inductively coupled plasma (ICP) is the most widely used plasma source in atomic emission spectroscopy (AES), also known as Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES). The ICP source, or torch, consists of three concentric quartz tubes with argon gas flowing through them. A spark from a Tesla coil initiates the ionization of argon, generating a high-temperature plasma.
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In 1931, physicist Ernst Ruska—building on the idea that magnetic fields can direct an electron beam just as lenses can direct a beam of light in an optical microscope—developed the first prototype of the electron microscope. This development led to the development of the field of electron microscopy. In the transmission electron microscope (TEM), electrons are produced by a hot tungsten element and accelerated by a potential difference in an electron gun, which gives them up to 400 keV in...
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The wavelengths of visible light ultimately limit the maximum theoretical resolution of images created by light microscopes. Most light microscopes can only magnify 1000X, and a few can magnify up to 1500X. Electrons, like electromagnetic radiation, can behave like waves, but with wavelengths of 0.005 nm, they produce significantly greater resolution up to 0.05 nm as compared to 500 nm for visible light. An electron microscope (EM) can create a sharp image that is magnified up to 2,000,000X.
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Updated: May 24, 2026

Preparing a Celadonite Electron Source and Estimating Its Brightness
09:14

Preparing a Celadonite Electron Source and Estimating Its Brightness

Published on: November 5, 2019

Low-energy, high-current, ion source with cold electron emitter.

A V Vizir1, M V Shandrikov, G Yu Yushkov

  • 1High Current Electronics Institute, Russian Academy of Sciences, Tomsk 634055, Russia. vizir@opee.hcei.tsc.ru

The Review of Scientific Instruments
|March 3, 2012
PubMed
Summary
This summary is machine-generated.

This study presents a novel two-stage ion source using a cold electron emitter for efficient ion generation and acceleration. The gridless design and optimized emitter material ensure a long lifetime and stable ion flow.

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Last Updated: May 24, 2026

Preparing a Celadonite Electron Source and Estimating Its Brightness
09:14

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Published on: November 5, 2019

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Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
06:58

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

Published on: July 12, 2016

Area of Science:

  • Plasma Physics
  • Ion Source Technology
  • Materials Science

Background:

  • Conventional ion sources often face limitations in efficiency, lifetime, and beam quality.
  • Developing advanced ion sources is crucial for applications in materials processing, fusion energy, and space propulsion.

Purpose of the Study:

  • To introduce a novel two-stage discharge ion source with electron injection from a cold emitter.
  • To characterize the performance of the ion source, including ion flow and acceleration capabilities.
  • To evaluate the long-term operational stability and lifetime of the electron emitter.

Main Methods:

  • Utilized a two-stage discharge system with electron injection from a cold cathode.
  • Employed a gridless ion acceleration system leveraging electric fields within a magnetic plasma confinement.
  • Investigated hollow cathode arc discharge with hidden cathode spots for reduced erosion.
  • Selected appropriate emitter materials to optimize performance and longevity.

Main Results:

  • Achieved stable ion flow with energies below 20 eV and a current of 5 A dc.
  • Demonstrated efficient gas ionization and ion beam formation through injected electron acceleration.
  • The hollow cathode design with hidden spots resulted in a very low erosion rate.
  • The selected emitter materials contributed to a significantly long operational lifetime.

Conclusions:

  • The presented two-stage ion source offers a promising solution for generating high-quality ion beams.
  • The gridless acceleration and robust emitter design contribute to enhanced performance and durability.
  • This technology has potential applications in various scientific and industrial fields requiring efficient ion generation.