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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
Published on: February 12, 2017
The sub-micron hole array in sapphire produced by inductively-coupled plasma reactive ion etching
Ming-Hua Shiao1, Chun-Ming Chang, Su-Wei Huang
1Instrument Technology Research Center, National Applied Research Laboratories, Hsinchu 300, Taiwan.
Journal of Nanoscience and Nanotechnology
|May 29, 2012
Summary
This study details fabricating sub-micron sapphire hole arrays using nanosphere lithography and plasma etching. This technique enables precise control over hole size for advanced material applications.
Area of Science:
- Materials Science
- Nanotechnology
- Surface Engineering
Background:
- Fabricating precise sub-micron structures is crucial for advanced materials.
- Sapphire substrates offer unique optical and mechanical properties.
- Existing fabrication methods can be complex and costly.
Purpose of the Study:
- To develop an efficient method for creating sub-micron hole arrays in sapphire.
- To utilize nanosphere lithography (NSL) and inductively-coupled-plasma reactive ion etching (ICP-RIE) for fabrication.
- To achieve controlled etching for specific hole dimensions.
Main Methods:
- Self-assembly of 600 nm polystyrene nanospheres on sapphire via spin-coating.
- Nanosphere diameter modification using oxygen plasma in ICP-RIE (450-550 nm).
- Deposition of a 100 nm chromium mask and subsequent ICP-RIE etching with Cl2/Ar and BCl3/Ar gas mixtures.
Main Results:
- Successful fabrication of a honeycomb-type chromium mask on sapphire.
- Controlled etching achieved, producing a 400 nm diameter hole array.
- Demonstrated tunability of nanosphere size and final hole diameter.
Conclusions:
- Nanosphere lithography combined with ICP-RIE is an effective method for sub-micron hole array fabrication in sapphire.
- The process allows for precise control over hole size by adjusting plasma etching parameters.
- This technique offers a viable route for producing patterned sapphire substrates for various applications.
