Related Experiment Video
Updated: May 21, 2026
07:09
Development of Efficient OLEDs from Solution Deposition
Published on: November 4, 2022
Thermally evaporated SiO thin films as a versatile interlayer for plasma-based OLED passivation.
Won Min Yun1, Jaeyoung Jang, Sooji Nam
1POSTECH Organic Electronics Laboratory, Polymer Research Institute, Department of Chemical Engineering, Pohang University of Science and Technology , Pohang, 790-784, Korea.
ACS Applied Materials & Interfaces
|June 1, 2012
Summary
Silicon monoxide (SiO) thin films protect organic light-emitting diodes (OLEDs) during plasma passivation. This SiO interlayer enhances barrier film performance, significantly increasing OLED device shelf life and reducing degradation.
Area of Science:
- Materials Science
- Surface Chemistry
- Device Physics
Background:
- Plasma-based passivation is crucial for organic light-emitting diode (OLED) stability.
- Existing passivation methods can cause electrical and optical degradation.
- Developing robust interlayers is essential for enhancing OLED device longevity.
Purpose of the Study:
- To investigate silicon monoxide (SiO) thin films as an interlayer for plasma-based OLED surface passivation.
- To evaluate the protective capabilities of SiO against plasma-induced degradation.
- To assess the impact of SiO on the performance of subsequent barrier films and overall device lifetime.
Main Methods:
- Sequential deposition of SiO thin films via thermal evaporation after OLED cathode deposition.
- Utilizing plasma-enhanced atomic layer deposition (PEALD) and plasma-enhanced chemical vapor deposition (PECVD) for passivation.
- Characterizing SiO interlayer properties, including plasma resistivity and UV-blocking.
- Evaluating surface morphology, pinhole coverage, and film density of subsequent Al2O3 barrier layers.
- Measuring device shelf life and water vapor transmission rate (WVTR) of bilayer SiO/Al2O3 films.
Main Results:
- SiO interlayers effectively protected OLED devices from plasma-induced degradation.
- The hydroxyl group-rich surface of SiO improved pinhole coverage and initial density of Al2O3 films.
- OLEDs with SiO/Al2O3 bilayer passivation showed significantly increased shelf life compared to Al2O3-only devices.
- The SiO/Al2O3 bilayer exhibited a 2.3 times lower WVTR (0.0033 g/(m2 day)) than a single Al2O3 film.
Conclusions:
- Silicon monoxide (SiO) serves as a multifunctional interlayer in plasma-based OLED passivation.
- The SiO layer acts as a damage-free protective shield for underlying OLEDs.
- SiO enhances the performance of upper barrier films, leading to improved device stability and extended operational lifetime.
